Features of Chemically Etched Porous Silicon

Layer Transfer from Chemically Etched 150 mm Porous Si Substrates

We demonstrate for the first time the successful layer transfer of an epitaxially grown monocrystalline Si film from a purely chemically etched porous Si substrate of 150 mm diameter to a glass carrier. The surface conditioning for all Si layer transfer processes based on porous Si has been, up to now without exception, carried out by electrochemical etching. In contrast, our chemical stain etc...

Chemically etched ultrahigh-Q wedge-resonator on a silicon chip

Ultrahigh-Q optical resonators are being studied across a wide range of fields, including quantum information, nonlinear optics, cavity optomechanics and telecommunications1–7. Here, we demonstrate a new resonator with a record Q-factor of 875 million for on-chip devices. The fabrication of our device avoids the requirement for a specialized processing step, which in microtoroid resonators8 has...

Self-Assembly of Densely Packed ZnO Nanorods Grown Chemically on Porous Silicon Substrate

Self-assembly of densely packed ZnO nanorods were grown on Porous Silicon (PS) substrate by low-temperature chemical bath deposition. The structural and optical properties of the obtained ZnO nanostructure...

self-assembly of densely packed zno nanorods grown chemically on porous silicon substrate

self-assembly of densely packed zno nanorods were grown on porous silicon (ps) substrate by low-temperature chemical bath deposition. the structural and optical properties of the obtained zno nanostructures on ps substrate were systematically studied. the strong and sharp (002) peak compared with other peaks in the x-ray diffraction (xrd) indicated thatzno nanorods formed with superior orientat...

Wet – Chemically Etched Silicon Nanowire Solar Cells: Fabrication and Advanced Characterization